Rothwell Figg Attorneys Author Comprehensive Overview of U.S. Patent Litigation for Chambers Patent Litigation 2026 Global Practice Guide
Rothwell Figg attorneys served as the exclusive authors of the United States chapter in the 2026 Chambers Patent Litigation Global Practice Guide. The 2026 guide features more than 30 jurisdictions and provides the latest information on intellectual property (IP) rights and granting procedures, initiating a patent infringement lawsuit, patent revocation and cancellation, patent remedies, litigation costs, alternative dispute resolution (ADR), and assignment and licensing of IP rights.
For the eighth consecutive year, partners Steven Lieberman, Joseph Hynds, and Jennifer Nock authored the U.S. 'Law & Practice' section, providing easily accessible information on navigating the legal system when conducting business in the United States. Steven, Joe, and Jen explain local law and practice at key transactional stages and for crucial aspects of doing business.
Steven and Nicole DeAbrantes authored the 'Trends & Developments' section, examining significant developments and emerging trends in U.S. patent litigation throughout 2025. The article covers the overhaul of the discretionary denial process in PTAB proceedings and the latest developments in patent eligibility of AI-related inventions.
Chambers Global Practice Guides deliver authoritative legal analysis for in-house counsel and business leaders across key jurisdictions worldwide. Designed with business clients in mind, the Chambers Global Practice Guides allow readers to assess and compare legal frameworks across jurisdictions in essential practice areas.
Rothwell Figg was again invited to serve as a Contributing Editor in recognition of the firm and Steven’s continued inclusion in the Chambers USA rankings for IP: Litigation and Media & Entertainment in the District of Columbia.
To access the U.S. “Law & Practice” and “Trends & Developments” sections of the 2026 Chambers Patent Litigation Global Practice Guide, please click here.
